No. |
題
目 |
Conference |
Authors |
1 |
Optical
Hall Effect in InN: Bulk Doping Mechanism and Surface Electron
Accumulation Properties |
PLCN10
|
V.
Darakchieva, M. Schubert, T. Hofmann, Monemar, W.J. Schaff, C.L. Hsiao,
L.C. Chen, L.W Tu, T. Yamaguchi and Y. Nanishi
|
2 |
Present
Status of Frontier Research on Nitride Semiconductor Optoelectronic
Devices
|
Japan-Korea
Joint Symposium |
Y.
Nanishi
|
3 |
Undoped
and Mg-doped InN Grown Using Droplet Elimination by Radical-beam
Irradiation Method
|
The
8th International Symposium on Semiconductor Light Emitting Devices
(ISSLED2010)
|
T.
Yamaguchi, K. Wang, R. Iwamoto, N. Miller, M. Mayer, J. W. Ager III, K.
M. Yu, W. Walukiewicz, T. Araki and Y. Nanishi
|
4 |
The
Study of InAs/InGaAs Dot-in-a-Well Structures for Quantum Dot Infrared
Photodectectors
|
15th
International Conference on Metal Organic Vapor Phase Epitaxy
|
J.
Kim, C. Yang, J. Lee, S. Ha, W. Choi, Y. Nanishi and E. Yoon
|
5 |
Growth
and Characterization of GaN Layer Using InN Interlayer and Sapphire
Substrate
|
15th
International Conference on Metal Organic Vapor Phase Epitaxy
|
K.
Lee, S. Park, J. Kim, N. Kim, M. Kim, H. Na, Y. Nanishi, and E. Yoon
|
6 |
Growth,
Monitoring and InN/InGaN MQW Structure Fabrication by DERI Method
|
IX
International Conference of Polish Society for Crystal Growth
|
Y.
Nanishi and T. Yamaguchi
|
7 |
RF-MBE
Growth of InN/InGaN MQW Structures by DERI and Their Characterization |
22nd
International Conference on Indium Phosphide and Related
Materials(IPRM2010)
|
T.
Araki, H. Umeda, T. Yamaguchi, T. Sakamoto, E. Yoon and Y. Nanishi
|
8 |
High-Pressure
Optical Absorption and Raman Scattering in InN Thin Films Grown by
Molecular Beam Epitaxy
|
2010
E‐MRS Spring Meeting
|
J.
Ibáñez, A. Segura, F. J. Manjón, R.
Cusco, L. Artús, T. Yamaguchi, and Y. Nanishi
|
9 |
Hydrogen
in InN: Ubiquitous Phenomena in Molecular Beam Epitaxy Grown Material
|
CIMTEC2010
(5th Forum on New Materials)
|
V.
Darakchieva, K. Lorenz, N. P. Barradas, E. Alves, M.-Y. Xie, B.
Monemar, M. Schubert, W.J. Schaff, C.L. Hsiao, L.C. Chen, L.W. Tu, T.
Yamaguchi, Y. Nanishi
|
10 |
Mg
Doped InN and Search for P-type InN
|
Electronic
Materials Conference 2010(EMC2010)
|
K.
Wang, R. Iwamoto, T.Yamaguchi, K. Kagawa, T. Araki, Y. Nanishi, N.
Miller, M. Mayer, W. Walukiewicz
|
11 |
Evidence
of Free Holes in Mg Doped InN
|
International
Symposium on Growth of III-Nitrides 2010
|
K.
Wang, R. Iwamoto, T.Yamaguchi, K. Kagawa, T. Araki, Y. Nanishi, N.
Miller, M. Mayer, J. W. Ager, K. M. Yu, W. Walukiewicz
|
12 |
Investigation
on InN mole fraction fluctuation in InGaN films grown by RF-MBE
|
International
Symposium on Growth of III-Nitrides 2010
|
T.
Kimura, E. Fukumoto, T. Yamaguchi, K. Wang, M. Kaneko, T. Araki, E.
Yoon and Y. Nanishi
|
13 |
Growth,
Monitoring, P-type doping and MQW Structure Fabrication by DERI Method
|
The
international worskshop on modern and advanced phenomena in wurtzite
semiconductors
|
Y.
Nanishi
|
14 |
High-Pressure
Optical Absorption and Raman Scattering in InN Thin Films Grown by
Molecular Beam Epitaxy
|
48th
European High Pressure Research Group Conference (EHPRG) |
F.
J. Manjón, J. Ibáñez, A. Segura, R.
Cuscó, L. Artús, T. Yamaguchi and Y. Nanishi
|
15 |
Effect
of low-temperature InN buffer on A-plane InN growth on nitridated
r-plane sapphire by RF-MBE
|
The
16th International Conference on Crystal Growth (ICCG16)
|
T.
Araki, K. Kawashima, T. Yamaguchi, and Y. Nanishi
|
16 |
InGaN
Growth Using Droplet Elimination by Radical-beam Irradiation
Method
|
|
T.
Yamaguchi, K. Wang, T. Araki, E. Yoon, Y. Nanishi
|
17 |
Potential,
Present Status and Future Challenges of InN and Related Alloys for
Device Applications
|
The
second LED domestic conference
|
Y.
Nanishi, T. Yamaguchi and E. Yoon
|
18 |
Growth
and Characterization of InN-Related Materials
|
Rainbow
Second Training Workshop
|
Y.
Nanishi
|
19 |
Raman
scattering study of the temperature dependence of phonons in InN
|
The
International Workshop on Nitride semiconductors (IWN2010)
|
N.
Domenech-Amador, L. Artús, R. Cuscó , J.
Ibáñez, T. Yamaguchi and Y. Nanishi
|
20 |
Evidence
of Rectification in InN pn Junctions
|
The
International Workshop on Nitride semiconductors (IWN2010)
|
N.
Miller, J. W. Ager III, E. E. Haller, W. Walukiewicz, Ke Wang, R.
Iwamoto, T. Yamaguchi, K. Kagawa, T. Araki, Y. Nanishi
|
21 |
Free
Hole Concentration and Mobility in InN: Mg
|
The
International Workshop on Nitride semiconductors (IWN2010)
|
N.
Miller, J. W. Ager III, E. E. Haller, W. Walukiewicz, Ke Wang, R.
Iwamoto, T. Yamaguchi, K. Kagawa, T. Araki, Y. Nanishi
|
22 |
Unintentional
incorporation of hydrogen in InN: diffusion kinetics and effect of
surface orientation
|
The
International Workshop on Nitride semiconductors (IWN2010)
|
V.
Darakchieva, K. Lorenz, N. P. Barradas, E. Alves, L. Artus, D. Rogala,
H.-W. Becker, C. L. Hsiao, L. C. Chen, L. W. Tu, T. Yamaguchi, Y.
Nanishi
|
23 |
Potential
of Nitride photocatalyst for water splitting
|
The
International Workshop on Nitride semiconductors (IWN2010)
|
K.
Ohkawa, T. Koyama, F. Sano, A. Hirako, T. Yamaguchi, Y. Nanishi
|
24 |
Wet
Etching Process for InN Device Fabrication
|
The
International Workshop on Nitride semiconductors (IWN2010)
|
A.
Miki, K. Morimoto, N. Maeda, T. Yamaguchi, T. Araki, and Y.
Nanishi
|
25 |
Theoretical
Calculation of DC Characteristics in Vertical Trench-Gate GaN
Metal-Oxide-Semiconductors
|
The
International Workshop on Nitride semiconductors (IWN2010)
|
T.
Fujishima, K. Chikamatsu, H. Otake, H. Ohta, and Y. Nanishi
|
26 |
Dry
etching of In-and N-polar InN using inductively-coupled plasma
|
The
International Workshop on Nitride semiconductors (IWN2010)
|
T.
Fujishima, S. Takahashi, K. Morimoto, R. Iwamoto, N. Uematsu, M.
Yutani, T. Yamaguchi, T. Araki, and Y. Nanishi
|
27 |
Mg
doped InN and search for holes
|
The
International Workshop on Nitride semiconductors (IWN2010)
|
K.
Wang, R. Iwamoto, T. Yamaguchi, K. Kagawa, T. Araki, Y. Nanishi, N.
Miller, M.Mayer, J W Ager, K. M. Yu, W. Walukiewicz
|
28 |
Surface
Kinetics of Indium Adlayers and Droplets and Their Roles in InN Growth
by Molecular Beam Epitaxy
|
The
International Workshop on Nitride semiconductors (IWN2010)
|
K.
Wang, T. Yamaguchi, T. Araki, and Y. Nanishi
|
29 |
Recent
Progress in Growth and Characterization of InN and Related Alloys and
Challenges for Device Applications
|
The
International Workshop on Nitride semiconductors (IWN2010)
|
Y.
Nanishi, T.Yamaguchi, K.Wang, T.Araki, M.Kaneko, E.Yoon, N.Miller,
J.W.AgerV, K.M.Yu, W.Walukiewicz
|
30 |
Droplet
elimination process by radical beam irradiation for the growth of
InN-based III-nitrides and its application to device structure
|
2010
International Coference on Solid State Devices and Materials
|
T.
Yamaguchi, Y. Nanishi
|
31 |
Recent
Research Activities in Japan toward Nitride Semiconductor
Opto-electronics Frontier
|
Korea
Optoelectronic Engineering Society
|
Y.
Nanishi
|
32 |
Recent
Progress in Growth and Characterization of InN and Related Alloys and
Challenges for Nano-Photonics
|
3rd
GIST Information and Mechatronics Week 2010
|
Y.
Nanishi
|
33 |
Growth
and Fabrication of InN-based III-nitride Structure Using Droplet
Elimination Process by Radical Beam Irradiation
|
SPIE
Photonic West 2011
|
T.
Yamaguchi, Y. Nanishi
|
34 |
TEM
Study on Microstructure of Mg-doped InN Grown by RF-MBE Using DERI
Method
|
3rd
International Symposium on
Advanced Plasma Science and its Applications for Nitrides and
Nanomaterials (ISPlasma2011)
|
T.Araki,
T. Sakamoto, R. Iwamoto, T. Yamaguchi, E. Yoon, Y. Nanishi
|
35 |
Development
of Radical Beam Monitoring Techniques in RF-MBE Growth of InN
|
3rd
International Symposium on
Advanced Plasma Science and its Applications for Nitrides and
Nanomaterials (ISPlasma2011)
|
T.
Yamaguchi, T. Fujishima, T. Araki, E. Yoon, Y. Nanishi
|
36 |
Recent
Progress in Growth and Characterization of InN and Related Alloys and
Those Nano-structures
|
Workshop
on Frontier Photonic and Electronic Materials and Devices
2011 German-Japanese-Spanish Joint Workshop
|
Y.
Nanishi, T.Yamaguchi ,K. Wang and T.Araki
|